SWHL - Technology with high potential.
- SWHL technology is most beneficial for MtM applications including but not limited to
MEMS, Sensors and Advance Packaging due to dramatic mask cost reduction and
simplification of lithography equipment.
- Several leading research institutes and semiconductor companies have examined the
theoretical and physical concept of SWHL technology and confirmed its viability but
want to see a proof of concept for further evaluation.
- SWHL is expected to enable substantial cost reductions while providing additional
technological functionality in IC manufacturing. To capitalize on the technology, it will
be critical to build a production near Alpha-Tool and to provide enough evidence that
the concept is viable and provides the anticipated performance. Once the technology
and its manufacturability are confirmed, SWHL could have a great future to the benefit
of the entire IC and related industry.
- DUVL (Deep Ultra Violet Litho) is reaching its technological limits. EUVL (Extreme
Ultra Violet Litho) is considered complex and its implementation challenging and costly
and only affordable for the largest IC manufacturers. SWHL has the potential to
become an alternative Lithography technology which could bring costs for Masks
production and maintenance significantly down. The technology will be attractive for
both, More than Moore (MtM) and More Moore (MM) markets.